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1

Electron-Phonon Mass Enhancement in Thermoelectricity

Opsal, Jon L., Thaler, Barry J., Bass, Jack

Journal:

Physical Review Letters

Year:

1976

Language:

english

File:

PDF, 794 KB

english, 1976

2

Gauge-independent statistical mechanics of free electrons in a magnetic field

Journal:

Physical Review B

Year:

1978

Language:

english

File:

PDF, 233 KB

english, 1978

3

Sublimation and Vapor Pressure of

Opsal, Jon L., Leming, Charles W., Pollack, Gerald L.

Journal:

Physical Review B

Year:

1973

Language:

english

File:

PDF, 562 KB

english, 1973

4

Temperature-dependent magnetoresistance of pure aluminum and dilute Al-Ga and Al-Mg alloys

Snodgrass, M. L., Blatt, F. J., Opsal, Jon L., Chiang, C. K.

Journal:

Physical Review B

Year:

1976

Language:

english

File:

PDF, 1.28 MB

english, 1976

5

Simultaneous determination of ultra-shallow junction depth and abruptness using thermal wave technique

Salnick, Alex, Nicolaides, Lena, Opsal, Jon, Jain, Amitabh, Rogers, Duncan, Robertson, Lance

Journal:

Review of Scientific Instruments

Year:

2004

Language:

english

File:

PDF, 800 KB

english, 2004

6

A photothermal method of simultaneous determination of ultra-shallow junction depth and abruptness

Salnick, Alex, Nicolaides, Lena, Opsal, Jon, Jain, Amitabh, Rogers, Duncan, Robertson, Lance

Journal:

MRS Proceedings

Year:

2004

Language:

english

File:

PDF, 77 KB

english, 2004

7

The mechanism of modulated optical reflectance imaging of dislocations in silicon

Jeff Bailey, Eicke R. Weber, Jon Opsal

Journal:

Journal of Crystal Growth

Year:

1990

Language:

english

File:

PDF, 871 KB

english, 1990

8

Relaxation of ion implant damage in silicon wafers at room temperature measured by thermal waves and double implant sheet resistance

John Schuur, Craig Waters, Jim Maneval, Nick Tripsis, Allan Rosencwaig, Michael Taylor, W.Lee Smith, Lawrence Golding, Jon Opsal

Journal:

Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms

Year:

1987

Language:

english

File:

PDF, 270 KB

english, 1987

9

Thermal-wave measurements of high-dose ion implantation

Michael Taylor, Kurt Hurley, King Lee, Mark LeMere, Jon Opsal, Tim O'Brien

Journal:

Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms

Year:

1991

Language:

english

File:

PDF, 407 KB

english, 1991

10

Thermal-wave detection and thin-film thickness measurements with laser beam deflection

Opsal, Jon, Rosencwaig, Allan, Willenborg, David L.

Journal:

Year:

1983

Language:

english

File:

PDF, 956 KB

english, 1983

11

Detection and analysis of depolarization artifacts in rotating-compensator polarimeters

Li, ShiFang, Opsal, Jon, Chu, Hanyou, Aspnes, David E.

Journal:

Journal of the Optical Society of America A

Year:

2001

Language:

english

File:

PDF, 178 KB

english, 2001

12

Efficient finite-element, Green's function approach for critical-dimension metrology of three-dimensional gratings on multilayer films

Chang, Yia-Chung, Li, Guangwei, Chu, Hanyou, Opsal, Jon

Journal:

Journal of the Optical Society of America A

Year:

2006

Language:

english

File:

PDF, 171 KB

english, 2006

13

Detection of thermal waves through optical reflectance

Rosencwaig, Allan, Opsal, Jon, Smith, W. L., Willenborg, D. L.

Journal:

Applied Physics Letters

Year:

1985

Language:

english

File:

PDF, 564 KB

english, 1985

14

Beam profile reflectometry: A new technique for dielectric film measurements

Rosencwaig, Allan, Opsal, Jon, Willenborg, D. L., Kelso, S. M., Fanton, J. T.

Journal:

Applied Physics Letters

Year:

1992

Language:

english

File:

PDF, 657 KB

english, 1992

15

SPIE Proceedings [SPIE SPIE's 27th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 3 March 2002)] Metrology, Inspection, and Process Control for Microlithography XVI - Fundamental solutions for real-time optical CD metrology

Opsal, Jon L., Chu, Hanyou, Wen, Youxian, Chang, Yia-Chung, Li, Guangwei, Herr, Daniel J. C.

Year:

2002

Language:

english

File:

PDF, 401 KB

english, 2002

16

Multiparameter measurements of thin films using beam-profile reflectometry

Fanton, J. T., Opsal, Jon, Willenborg, D. L., Kelso, S. M., Rosencwaig, Allan

Journal:

Journal of Applied Physics

Year:

1993

Language:

english

File:

PDF, 1017 KB

english, 1993

17

Theory of elastic wave scattering: Applications of the method of optimal truncation

Opsal, Jon L., Visscher, William M.

Journal:

Journal of Applied Physics

Year:

1985

Language:

english

File:

PDF, 1.15 MB

english, 1985

18

Thermal-wave depth profiling: Theory

Journal:

Journal of Applied Physics

Year:

1982

Language:

english

File:

PDF, 760 KB

english, 1982

19

Improved calculations of Kapitza resistance: Combined effects of phonon attenuation and impedance matching on Kapitza resistance

Opsal, Jon L., Pollack, Gerald L.

Journal:

Physical Review A

Year:

1974

Language:

english

File:

PDF, 1.22 MB

english, 1974

20

Thermal and plasma wave depth profiling in silicon

Opsal, Jon, Rosencwaig, Allan

Journal:

Applied Physics Letters

Year:

1985

Language:

english

File:

PDF, 529 KB

english, 1985

21

[IEEE 2007 IEEE/SEMI Advanced Semiconductor Manufacturing Conference - Stresa, Italy (2007.06.11-2007.06.12)] 2007 IEEE/SEMI Advanced Semiconductor Manufacturing Conference (ASMC) - Thickness and Topography of Dielectric Dual-Sidewall Spacers on Metal Gate of DRAM Extracted by Spectroscopic Ellipsometry

Gong, Jun-Wei, Fang, Yeh-Chang, Wang, Ta-Yung, Hu, Jia-Rui, Chang, Chung-I, Lee, Shih-Jung, Opsal, Jon

Year:

2007

Language:

english

File:

PDF, 519 KB

english, 2007

22

Nonthermal laser-induced recrystallization of amorphous silicon

Bailey, Jeff, Weber, Eicke R., Opsal, Jon, Rosencwaig, Allan

Journal:

Physical Review B

Year:

1991

Language:

english

File:

PDF, 841 KB

english, 1991

23

Detection of thermal waves through modulated optical transmittance and modulated optical scattering

Rosencwaig, Allan, Opsal, Jon, Smith, W. L., Willenborg, D. L.

Journal:

Journal of Applied Physics

Year:

1986

Language:

english

File:

PDF, 503 KB

english, 1986

24

Temporal behavior of modulated optical reflectance in silicon

Opsal, Jon, Taylor, Michael W., Smith, W. Lee, Rosencwaig, Allan

Journal:

Journal of Applied Physics

Year:

1987

Language:

english

File:

PDF, 1.32 MB

english, 1987

25

Comment on ‘‘Spatially resolved defect mapping in semiconductors using laser-modulated thermoreflectance’’ [Appl. Phys. Lett. 47, 1336 (1985)]

Rosencwaig, Allan, Opsal, Jon, Smith, W. L., Willenborg, D. L.

Journal:

Applied Physics Letters

Year:

1986

Language:

english

File:

PDF, 289 KB

english, 1986

26

Nonlinear fundamental photothermal response in three-dimensional geometry: Theoretical model

Mandelis, Andreas, Salnick, Alex, Opsal, Jon, Rosencwaig, Allan

Journal:

Journal of Applied Physics

Year:

1999

Language:

english

File:

PDF, 495 KB

english, 1999

27

Nondestructive analysis of ultrashallow junctions using thermal wave technology

Nicolaides, Lena, Salnick, Alex, Opsal, Jon

Journal:

Review of Scientific Instruments

Year:

2003

Language:

english

File:

PDF, 282 KB

english, 2003

28

SPIE Proceedings [SPIE International Symposium on Optical Science and Technology - San Diego, CA (Sunday 29 July 2001)] Optical Metrology Roadmap for the Semiconductor, Optical, and Data Storage Industries II - Rapid x-ray reflectivity (XRR) characterization and process monitoring of multilayer Ta/Al2O3/Ta/SiO2/Si

Leng, JingMin, Opsal, Jon L., Duparre, Angela, Singh, Bhanwar

Year:

2001

Language:

english

File:

PDF, 228 KB

english, 2001

29

SPIE Proceedings [SPIE Microlithography 2004 - Santa Clara, CA (Sunday 22 February 2004)] Metrology, Inspection, and Process Control for Microlithography XVIII - Finite difference algorithm in real-time optical CD applications

Opsal, Jon L., Chu, Hanyou, Leng, Jingmin, Silver, Richard M.

Year:

2004

Language:

english

File:

PDF, 463 KB

english, 2004

30

Analysis of polyaromatic hydrocarbon mixtures with laser ionization gas chromatography/mass spectrometry

Rhodes, Gerald., Opsal, Richard B., Meek, Jon T., Reilly, James P.

Journal:

Analytical Chemistry

Year:

1983

Language:

english

File:

PDF, 1.00 MB

english, 1983

31

SPIE Proceedings [SPIE Microlithography 2005 - San Jose, CA (Sunday 27 February 2005)] Metrology, Inspection, and Process Control for Microlithography XIX - Optical characterization of 193nm amorphous carbon ARC films

Leng, Jingmin, Silver, Richard M., Opsal, Jon, Pois, Heath

Year:

2005

Language:

english

File:

PDF, 288 KB

english, 2005

32

SPIE Proceedings [SPIE 25th Annual Technical Symposium - San Diego (Monday 24 August 1981)] New Methods for Optical, Quasi-Optical, Acoustic, and Electromagnetic Synthesis - Recent Developments In Diffraction Theory And Their Effect On The Design Of Ultrasonic Inspection Systems

Opsal, Jon L., Stone, W. Ross

Year:

1982

Language:

english

File:

PDF, 411 KB

english, 1982

33

SPIE Proceedings [SPIE Metallization: Performance and Reliability Issues for VLSI and ULSI - San Jose, United States (Thursday 12 September 1991)] Metallization: Performance and Reliability Issues for VLSI and ULSI - Application of thermal wave technology to thickness and grain size monitoring of aluminum films

Opsal, Jon L., Gildenblat, Gennady S., Schwartz, Gary P.

Year:

1991

Language:

english

File:

PDF, 967 KB

english, 1991

34

SPIE Proceedings [SPIE Process Module Metrology, Control and Clustering - San Jose, United States (Wednesday 11 September 1991)] Process Module Metrology, Control and Clustering - Novel microspot dielectric film thickness measurement system

Willenborg, David, Kelso, Susan M., Opsal, Jon L., Fanton, Jeffrey T., Rosencwaig, Allan, Davis, Cecil J., Herman, Irving P., Turner, Terry R.

Year:

1992

Language:

english

File:

PDF, 588 KB

english, 1992

35

SPIE Proceedings [SPIE Microlithography 2005 - San Jose, CA (Sunday 27 February 2005)] Metrology, Inspection, and Process Control for Microlithography XIX - Strained-silicon metrology using a multi-technology optical system

Pois, Heath, Silver, Richard M., Morris, Stephen, Opsal, Jon, Paranjpe, Ajit, Cody, Nyles, Landin, Trevan

Year:

2005

Language:

english

File:

PDF, 375 KB

english, 2005

36

SPIE Proceedings [SPIE Microelectronic Manufacturing 1996 - Austin, TX (Wednesday 16 October 1996)] Optical Characterization Techniques for High-Performance Microelectronic Device Manufacturing III - Spectrophotometry and beam profile reflectometry measurement of six layers in an SOI film stack

Leng, JingMin, Sidorowich, John J., Yoon, Y. D., Opsal, Jon L., Lee, B. H., Cha, Giho, Moon, Joo-Tae, Lee, Sang-In, DeBusk, Damon K., Chen, Ray T.

Year:

1996

Language:

english

File:

PDF, 131 KB

english, 1996

37

SPIE Proceedings [SPIE International Symposium on Optical Science and Technology - San Diego, CA (Sunday 30 July 2000)] Optical Metrology Roadmap for the Semiconductor, Optical, and Data Storage Industries - Rotating compensator spectroscopic ellipsometry (RCSE) and its application to high-k dielectric film HfO2

Leng, JingMin, Li, Shifang, Opsal, Jon L., Aspnes, David E., Lee, Byoung H., Lee, Jack C., Al-Jumaily, Ghanim A., Duparre, Angela, Singh, Bhanwar

Year:

2000

Language:

english

File:

PDF, 1.41 MB

english, 2000

38

SPIE Proceedings [SPIE International Symposium on Optical Science and Technology - Seattle, WA (Sunday 7 July 2002)] Advanced Characterization Techniques for Optical, Semiconductor, and Data Storage Components - Multidomain genetic algorithm (MDGA) and its applications to thin film metrology

Leng, JingMin, Sidorowich, John J., Opsal, Jon L., Duparr, Angela, Singh, Bhanwar

Year:

2002

Language:

english

File:

PDF, 480 KB

english, 2002

39

SPIE Proceedings [SPIE Microlithography 2003 - Santa Clara, CA (Sunday 23 February 2003)] Metrology, Inspection, and Process Control for Microlithography XVII - Real-time optical CD metrology for litho process

Opsal, Jon L., Wen, Youxian, Lee, Joungchel, Smith, Walter L., Herr, Daniel J.

Year:

2003

Language:

english

File:

PDF, 431 KB

english, 2003

40

SPIE Proceedings [SPIE Process Module Metrology, Control and Clustering - San Jose, United States (Wednesday 11 September 1991)] Process Module Metrology, Control and Clustering - Effects of feature edges on thickness readings of thin oxides

Opsal, Jon L., Willenborg, David, Fanton, Jeffrey T., Kelso, Susan M., Simmons, Jim P., Rosencwaig, Allan, Davis, Cecil J., Herman, Irving P., Turner, Terry R.

Year:

1992

Language:

english

File:

PDF, 488 KB

english, 1992

41

SPIE Proceedings [SPIE Microlithography 2004 - Santa Clara, CA (Sunday 22 February 2004)] Metrology, Inspection, and Process Control for Microlithography XVIII - Contact hole application for lithography process development using the Opti-Probe three-dimensional RT/CD technology

Jiang, Zhiming, Silver, Richard M., Sorkhabi, Osman, Chu, Hanyou, Cao, XueLong, Li, Guangwei, Wen, Youxian, Opsal, Jon L., Chang, Yia-Chung

Year:

2004

Language:

english

File:

PDF, 590 KB

english, 2004

42

SPIE Proceedings [SPIE SPIE's 1993 International Symposium on Optics, Imaging, and Instrumentation - San Diego, CA (Sunday 11 July 1993)] Interferometry VI: Applications - Novel technique for performing ellipsometric measurements in a submicrometer area

Fanton, Jeffrey T., Opsal, Jon L., Rosencwaig, Allan, Willenborg, David, Pryputniewicz, Ryszard J., Brown, Gordon M., Jueptner, Werner P. O.

Year:

1994

Language:

english

File:

PDF, 570 KB

english, 1994

43

SPIE Proceedings [SPIE Photonics Asia 2004 - Beijing, China (Monday 8 November 2004)] Advanced Microlithography Technologies - CD variation control based on accurate characterization of 193-nm material and CD metrology

Wen, Youxian, Wang, Yangyuan, Yao, Jun-en, Pois, Heath, Opsal, Jon, Progler, Christopher J.

Year:

2004

Language:

english

File:

PDF, 260 KB

english, 2004

44

SPIE Proceedings [SPIE Microlithography 2005 - San Jose, CA (Sunday 27 February 2005)] Metrology, Inspection, and Process Control for Microlithography XIX - Performance of measuring contact holes using the Opti-Probe 7341 3-D RT/CD technology

Sorkhabi, Osman, Silver, Richard M., Pois, Heath, Chu, Hanyou, Wen, Youxian, Opsal, Jon, Kim, Won D.

Year:

2005

Language:

english

File:

PDF, 616 KB

english, 2005

45

SPIE Proceedings [SPIE Microlithography 2005 - San Jose, CA (Sunday 27 February 2005)] Metrology, Inspection, and Process Control for Microlithography XIX - Critical dimension uniformity control with combined ellipsometry and reflectometry

Opsal, Jon, Silver, Richard M., Leng, Jingmin, Cao, Xuelong

Year:

2005

Language:

english

File:

PDF, 433 KB

english, 2005

46

SPIE Proceedings [SPIE Microlithography 2003 - Santa Clara, CA (Sunday 23 February 2003)] Metrology, Inspection, and Process Control for Microlithography XVII - Contact hole inspection by real-time optical CD metrology

Opsal, Jon L., Herr, Daniel J., Chu, Hanyou, Wen, Youxian, Li, Guangwei, Chang, Yia-Chung

Year:

2003

Language:

english

File:

PDF, 430 KB

english, 2003

47

SPIE Proceedings [SPIE Microlithography 2005 - San Jose, CA (Sunday 27 February 2005)] Metrology, Inspection, and Process Control for Microlithography XIX - Application of scatterometry for evaluation of lithographic process and OPC model generation

Huang, Karen, Silver, Richard M., Lee, Joungchel, Wen, Youxian, Opsal, Jon

Year:

2005

Language:

english

File:

PDF, 456 KB

english, 2005

48

SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 25 February 2007)] Metrology, Inspection, and Process Control for Microlithography XXI - High-resolution in-die metrology using beam profile reflectometry and ellipsometry

Jun, Chungsam, Archie, Chas N., Park, Jangik, Opsal, Jon, Pois, Heath, Kim, In-Kyo, Kim, Jung-Wook, Nicolaides, Lena

Year:

2007

Language:

english

File:

PDF, 177 KB

english, 2007

49

SPIE Proceedings [SPIE Optical Science and Technology, SPIE's 48th Annual Meeting - San Diego, California, USA (Sunday 3 August 2003)] Advanced Characterization Techniques for Optics, Semiconductors, and Nanotechnologies - Thin film 193nm TNK measurement using multi-domain genetic algorithm (MDGA) with a combination of beam profile reflectometry (BPR), absolute ellipsometry (AE), and spectroscopic ellipsometry (SE)

Opsal, Jon L., Duparre, Angela, Singh, Bhanwar, Leng, Jingmin, Ke, Chih-Ming, Chen, Pei-Hung, Chen, Jeng-Horng, Ku, Yao-Ching

Year:

2003

Language:

english

File:

PDF, 313 KB

english, 2003

50

[ASCE PHOTOACOUSTIC AND PHOTOTHERMAL PHENOMENA - Rome (Italy) (23-27 Aug 1998)] Proceedings of the 10th international conference on photoacoustic and photothermal phenomena - Nonlinear fundamental photothermal response in 3D geometry: Experimental results for tungsten

Salnick, Alex, Chen, Li, Opsal, Jon, Rosencwaig, Allan, Mandelis, Andreas

Year:

1999

Language:

english

File:

PDF, 203 KB

english, 1999